Prof. Jorge J. Rocca
August, 27-31. 2012
Jorge J. Rocca is
a University Distinguished Professor in the Departments of Electrical and
Computer Engineering and of Physics at
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Grading
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Outline
Nano printing | Microscopy | Chemical Spectroscopies | Interferometry | Microscopy | Nano Machining | Nano ablation | Plasma Diasnostics | Nano Paterning |
Course description
Extreme-ultraviolet (EUV) and X-ray laser radiation is in a region of the spectrum that is rapidly emerging as an indispensable tool for science and nanotechnology. The course will review the fundamental physics concepts that make these ultra-short wavelength lasers possible, and the technical challenges that have been overcome to generate extremely bright laser beams at these wavelengths. The atomic processes and gain medium conditions for the generation of X-ray laser radiation will be discussed. The course will also review how radiation at these short wavelengths interacts with matter and how is used in applications. Applications of EUV and soft X-ray laser light will be discussed that include studies in basic science, ultrahigh-resolution microscopy, the probing of materials with nano-scale resolution, and nano-patterning techniques. The state-of-the-art and the future of X-ray lasers will be discussed.
Interesados escribir a: María Gabriela Capeluto, email: maga@df.uba.ar
Course grade will be based on homework
problems, and on a paper (10-15 pages) and presentation (~20 minutes) on a
topic of relevance to the course.
Laser
Pumped SXRL λ= 8.8–
32.6 nm
Course outline
Motivation for the development of X-ray lasers and brief history of the field.
Basic absorption and emission processes
Discharge
Pumped SXRL λ=46.9
nm
Atomic
energy levels and allowed transitions.
Scattering, diffraction and refraction of
electromagnetic radiation
•High pulse energy (µJ-mJ) •High
monochromaticity (λ/Δλ
< 10-4) •High peak spectral
brightness
Basic
parameters for describing a plasma
Physics of dense plasmas
Plasma models
X-Ray emission from hot dense plasmas
Laser created plasmas: absorption and
density gradients
Capillary discharge and Z pinch plasmas
Spectroscopy of dense plasmas
Ni-like Lanthanum 4d1S0-
4p1P1
Amplification of radiation and gain
saturation in plasmas
Effect of
refraction
X-ray laser atomic excitation mechanisms :
Collisional electron impact lasers, recombination lasers, and Inner-shell photoionization lasers
Laser-pumped soft X-ray lasers.
Discharge pumped soft X-ray lasers
Approaches to practical table-top lasers
X-ray free-electron lasers
Achievement of full coherence: Injection-seeded soft X-ray lasers
Reflection and
refraction of soft x-ray radiation.
Enhanced
reflectivity from periodic structures.
Multilayer
interference coatings.
Applications of multilayer coated optics.
5.1 Soft X-Ray microscopy
Fresnel zone plate lens
Diffraction of radiation by pinhole
apertures and zone plates
High resolution soft X-ray microscopy and
application
Movies of nano-scale
phenomena using soft x-ray laser light.
5.2 Soft X-Ray Laser Interferometry
Soft X-ray interferometers
High density plasma diagnostics with soft Xray lasers
5.5. Nano-patterning
and nano-machining with soft x-ray lasers
Interferometric lithography
Coherent Talbot printing
Laser nano-machining
5.4 Metrology for Extreme Ultraviolet
lithography of the next generations of
Computer processors
Extreme Ultraviolet lithography
5.5. Analytic Nano-probes
Nano-scale laser ablation
Mass spectrometry nanoprobes
1) Class Notes by J. J. Rocca,
2) Selected papers fromthe scientific literature (to be provided),
3) Supporting book "Soft X-Rays and Extreme Ultraviolet Radiation. Principles and Applications". David Attwood. Cambridge University Press. (Each student will be provided with a copy of this book at no cost)